Fashion Scout announces SS17 Merit Award winner

By

Barbara Santamaria

Published
Aug 19, 2016

London support platform for emerging designers, Fashion Scout, has announced the winner of this season’s Merit Award, an initiative created to develop new designer business on a global level.

Eponymous New York Label Han Wen has been selected from hundreds of applicants for the designer’s attention to detail and combination of gold hardware, soft shell pink pleats and complex leather work.

The award includes a fully sponsored catwalk show during London Fashion Week as well as showcasing in Fashion Scout’s London exhibition, where he will be exposed to both UK and international press and buyers.

Ads

Fashion Scout’s Founder and Creative Director Martyn Roberts comments “Han Wen is a truly talented graduate of Parsons New York. His avant-garde collection is modern, edgy and extremely well made. Han Wen is a gifted designer who has great potential.”

Han Wen became a finalist in the fifth edition of the Parsons x Kering Empowering Imagination design competition and was featured in Vogue US’ online site as part of a series on the finalists.

“I have been a big fan of Fashion Scout since I was a sophomore student at Parsons School of Design. I have always appreciated how the European fashion industry has always supported and encouraged up and coming designers. It is such an honour for me to receive this award, and I really can’t wait to present my creations to London and the world,” said Han Wen.

Previous Merit Award winners include David Koma, Eudon Choi, Phoebe English, Roberts|Wood and Xiao Li.